DEPOSITION CARBON NANOSTRUCTURES BY SURFATRON GENERATED DISCHARGE

Davydova , Marina; Smid , Jiri; Hubicka , Zdenek; Kromka , Alexander

dc.contributor.author	Davydova , Marina
dc.contributor.author	Smid , Jiri
dc.contributor.author	Hubicka , Zdenek
dc.contributor.author	Kromka , Alexander
dc.date.accessioned	2017-02-09T09:35:57Z
dc.date.available	2017-02-09T09:35:57Z
dc.date.issued	2014
dc.identifier.citation	Acta Polytechnica. 2014, vol. 54, no. 6, p. 389-393.
dc.identifier.issn	1210-2709 (print)
dc.identifier.issn	1805-2363 (online)
dc.identifier.uri	http://hdl.handle.net/10467/67168
dc.description.abstract	Carbon nanostructures were deposited by surface wave discharge using various Ar/CH4/ CO2 gas mixture ratios. The morphology was controlled by adjusting of gas concentration and was investigated by scanning electron microscopy (SEM). Also, the influence of the low temperature plasma treatment and process time on the wettability of the diamond films has been studied. The results indicate that for hydrogen termination of diamond surface indicate that the temperature as low as 400°C and treatment time of 15 min is sufficient to attain the p-type surface conductivity of diamond.	en
dc.format.mimetype	application/pdf
dc.language.iso	eng
dc.publisher	České vysoké učení technické v Praze	cs
dc.publisher	Czech Technical University in Prague	en
dc.relation.ispartofseries	Acta Polytechnica
dc.relation.uri	https://ojs.cvut.cz/ojs/index.php/ap/article/view/2228
dc.rights	Creative Commons Attribution 4.0 International License	en
dc.rights.uri	http://creativecommons.org/licenses/by/4.0/
dc.title	DEPOSITION CARBON NANOSTRUCTURES BY SURFATRON GENERATED DISCHARGE
dc.type	article	en
dc.date.updated	2017-02-09T09:35:57Z
dc.identifier.doi	10.14311/AP.2014.54.0389
dc.rights.access	openAccess
dc.type.status	Peer-reviewed
dc.type.version	publishedVersion

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