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dc.contributor.authorDavydova , Marina
dc.contributor.authorSmid , Jiri
dc.contributor.authorHubicka , Zdenek
dc.contributor.authorKromka , Alexander
dc.date.accessioned2017-02-09T09:35:57Z
dc.date.available2017-02-09T09:35:57Z
dc.date.issued2014
dc.identifier.citationActa Polytechnica. 2014, vol. 54, no. 6, p. 389-393.
dc.identifier.issn1210-2709 (print)
dc.identifier.issn1805-2363 (online)
dc.identifier.urihttp://hdl.handle.net/10467/67168
dc.description.abstractCarbon nanostructures were deposited by surface wave discharge using various Ar/CH4/ CO2 gas mixture ratios. The morphology was controlled by adjusting of gas concentration and was investigated by scanning electron microscopy (SEM). Also, the influence of the low temperature plasma treatment and process time on the wettability of the diamond films has been studied. The results indicate that for hydrogen termination of diamond surface indicate that the temperature as low as 400°C and treatment time of 15 min is sufficient to attain the p-type surface conductivity of diamond.en
dc.format.mimetypeapplication/pdf
dc.language.isoeng
dc.publisherČeské vysoké učení technické v Prazecs
dc.publisherCzech Technical University in Pragueen
dc.relation.ispartofseriesActa Polytechnica
dc.relation.urihttps://ojs.cvut.cz/ojs/index.php/ap/article/view/2228
dc.rightsCreative Commons Attribution 4.0 International Licenseen
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/
dc.titleDEPOSITION CARBON NANOSTRUCTURES BY SURFATRON GENERATED DISCHARGE
dc.typearticleen
dc.date.updated2017-02-09T09:35:57Z
dc.identifier.doihttps://doi.org/10.14311/AP.2014.54.0389
dc.rights.accessopenAccess
dc.type.statusPeer-reviewed
dc.type.versionpublishedVersion


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Except where otherwise noted, this item's license is described as Creative Commons Attribution 4.0 International License