DEPOSITION CARBON NANOSTRUCTURES BY SURFATRON GENERATED DISCHARGE

Abstract

Carbon nanostructures were deposited by surface wave discharge using various Ar/CH4/ CO2 gas mixture ratios. The morphology was controlled by adjusting of gas concentration and was investigated by scanning electron microscopy (SEM). Also, the influence of the low temperature plasma treatment and process time on the wettability of the diamond films has been studied. The results indicate that for hydrogen termination of diamond surface indicate that the temperature as low as 400°C and treatment time of 15 min is sufficient to attain the p-type surface conductivity of diamond.