Browsing Acta Polytechnica. 2013, vol. 53, no. 2 by Subject "chemical vapour deposition"
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Positioning of the Precursor Gas Inlet in an Atmospheric Dielectric Barrier Reactor and its Effect on the Quality of Deposited TiOx Thin Film Surface
(České vysoké učení technické v PrazeCzech Technical University in Prague, 2013)Thin film technology has become pervasive in many applications in recent years, but it remains difficult to select the best deposition technique. A further consideration is that, due to ecological demands, we are forced ...